Ghoneim's APL 2013

Ghoneim's graphene transfer paper in APL

With 7148 hits (as of 9:36 PM, CST 26th April 2013) in You Tube video (, an archival publication was a necessity for Ghoneim and now comes the fruit of perseverance by an acceptance in APL. Way to go Ghoneim!
"Simplistic Graphene Transfer Process and Its Impact on Contact resistance" by Mohamed T Ghoneim, Casey E. Smith and Muhammad M. Hussain
Chemical vapor deposition based graphene grown on copper foil is widely used because of their reliable growth process, large area coverage, and relatively defect free nature. However, their transfer process for device fabrication is sensitive and can impact contact resistance. Although ultra-high mobility is graphene’s more pronounced feature, high contact resistance due to graphene’s low effective mass and hence limited density of states is hindering its true potential. Therefore, we report a simple poly-(methyl methacrylate) (PMMA) based transfer process without post-annealing to achieve specific contact resistivity of 3.8 x 10-5 Ω-cm2 which shows 80% reduction than previously reported values.