With
7148 hits (as of 9:36 PM, CST 26th April 2013) in You Tube video (http://www.youtube.com/watch?v=6M8mg2nDkL4), an archival publication was a
necessity for Ghoneim and now comes the fruit of perseverance by an acceptance
in APL. Way to go Ghoneim!
"Simplistic
Graphene Transfer Process and Its Impact on Contact resistance" by Mohamed
T Ghoneim, Casey E. Smith and Muhammad M. Hussain
Chemical
vapor deposition based graphene grown on copper foil is widely used because of
their reliable growth process, large area coverage, and relatively defect free
nature. However, their transfer process for device fabrication is sensitive and
can impact contact resistance. Although ultra-high mobility is graphene’s more
pronounced feature, high contact resistance due to graphene’s low effective
mass and hence limited density of states is hindering its true potential.
Therefore, we report a simple poly-(methyl
methacrylate) (PMMA)
based transfer process without post-annealing to achieve specific contact
resistivity of 3.8 x 10-5 Ω-cm2 which shows 80% reduction
than previously reported values.